Matthew Voss

Matthew Voss is a Senior Staff Resist Chemist at Inpria, focusing on the development and evaluation of novel metal oxide photoresists for photolithography applications. Previously, Voss served as a Graduate Student Researcher and Postdoctoral Researcher at UCLA's Schwartz Lab, engaging in advanced spectroscopic techniques related to polymer-fullerene solar cells and polymer films. Voss also held research fellow positions at Universidad de Buenos Aires and California Institute of Technology, where expertise was developed in photophysics and atmospheric chemistry. Voss earned a PhD in Chemistry from UCLA and a BS in Chemistry with a concentration in Material Science from Caltech.