David H. Wang

David Wang is ACM’s founder and has served as Chief Executive Officer and President and also as a company director since January 1998. Dr. Wang received a Ph.D. and Master of Engineering in Precision Engineering from Osaka University and a Bachelor of Science in Precision Instruments from Tsinghua University. He is the inventor of stress-free Cu polishing technology, and he holds more than 100 patents in semiconductor equipment and process technology. Dr. Wang brings extensive experience in semiconductor equipment, manufacturing processes and markets from his many years of leadership in the industry.