Luis Fernandez has over 20 years of experience in process engineering within the semiconductor industry. Currently serving as Process Engineering Manager at Tokyo Electron since 2005, Luis has held roles including Principal Process Engineer for Gas Cluster Ion Beam and Senior Process Engineer for Plasma Etch, where significant contributions include the development of Polysilicon and Metal Gate Etching processes. Prior experience includes four years at Philips Semiconductors, focusing on advanced patterning and dry plasma etching for the 0.18uM node, and four years at Samsung Semiconductor as a process engineer in plasma etch. Luis holds a Bachelor's Degree in Mechanical Engineering from Rice University, earned in 1997.
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