Takashi Fuse is a Senior Engineer and Application Scientist at Tokyo Electron LTD in the Innovative Technology Planning Department since August 2009, specializing in selective growth with organic SAM and research on system contamination. Previous roles include Visiting Scientist at Stanford University, focusing on semiconductor fabrication, and Engineer at the Advanced Lithography Project and e-BEAM Corp, both engaged in the development of Electron beam lithography systems. Earlier experience includes work as an Application Engineer at Tokyo Electron, a Visiting Scholar at Cornell University studying low energy ions' interactions with semiconductor surfaces, and a Research Fellow at the Japan Society for the Promotion of Science. Takashi Fuse holds a Ph.D. in Electrical and Electronics Engineering from Osaka University and a Master's in Physics from Ritsumeikan University.
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